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What is Semi Process Lab?

The Semi Process Lab is an innovative online platform specifically designed for professionals in the semiconductor and display fields, allowing them to accurately forecast process results. Its extensive array of Design · Predict tools incorporates numerous modeling methods for techniques like ALD, CVD, PECVD, PVD, RIE, and ALE, which are intended to help estimate vital metrics such as film growth, thickness, wafer uniformity, step coverage, and etch profiles. Users can delve into wafer map analyses and visualize intricate structures in 3D, including trenches, vias, or multi-layered designs, while also examining various equipment setups and device configurations. The platform promotes experimentation by offering model recommendations that help refine process parameters or create new experimental methodologies. In addition, it seamlessly integrates measured equipment data for calibration and provides a selection of design templates along with AI-enhanced image generation capabilities. Users have the convenience of exporting their results in various formats like PPTX, Word, Excel, and PNG, and they can also utilize free calculators for assessing film uniformity, ALD growth per cycle, etch selectivity, and step coverage. Ultimately, this web application not only delivers prediction outcomes as process-design estimates but also encourages users to validate these predictions on their specific equipment for accuracy. By fostering a comprehensive approach to design and analysis, the platform significantly enhances the productivity and efficiency of engineers in their optimization efforts. This robust functionality allows professionals to make informed decisions and drive innovation in their respective fields.

What is DIGIMU?

DIGIMU® specializes in generating digital polycrystalline microstructures that faithfully represent the diverse properties of materials, thereby accommodating the complex topological characteristics of the microstructure. The boundary conditions set for the Representative Elementary Volume (REV) are designed to replicate the conditions experienced by a material point on a larger scale, especially during relevant thermomechanical cycles. By utilizing a Finite Element formulation, the software effectively models a range of physical phenomena associated with metal forming operations, including recrystallization, grain growth, and Zener pinning due to secondary phase particles. To boost digital precision while reducing computation times, DIGIMU® leverages sophisticated automated anisotropic meshing and remeshing adaptation technologies, which facilitate an accurate depiction of grain boundaries while optimizing element usage. This cutting-edge methodology not only accelerates the computational workflow but also enhances the dependability of the simulations, establishing DIGIMU® as an indispensable resource for material scientists. Additionally, its ability to manage complex simulations without sacrificing accuracy positions DIGIMU® at the forefront of materials research and development.

Media

Media

Integrations Supported

Additional information not provided

Integrations Supported

Additional information not provided

API Availability

API Availability

Pricing Information

Plans use credits. New accounts receive free signup credits; additional credits are available through subscriptions or credit packs.

Pricing Information

Pricing not provided

Supported Platforms

SaaS

Supported Platforms

Windows

Customer Service / Support

Web-Based Support

Customer Service / Support

Standard Support
Web-Based Support

Training Options

Documentation Hub

Training Options

Documentation Hub
Webinars
Online Training

Company Facts

Organization Name

Quantum Materials

Company Location

South Korea

Company Website

semiprocesslab.com

Company Facts

Organization Name

TRANSVALOR

Date Founded

1984

Company Location

France

Company Website

www.transvalor.com/en/digimu

Categories and Features

Materials Science

Not specified

Categories and Features

Materials Science

Not specified

Simulation

Not specified

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